SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - Phase imaging of EUV masks using a lensless EUV microscopeHarada, Tetsuo; Nakasuji, Masato; Nagata, Yutaka; Watanabe, Takeo; Kinoshita, Hiroo; Kato, Kokoro · 2013