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A Low Temperature Collimated Titanium Deposition ProcessHegde, Rama I. · Journal of The Electrochemical Society · 1997
Thin Film Properties of Tungsten Nucleation Layer in Blanket Tungsten DepositionHegde, Rama I. · Journal of The Electrochemical Society · 1997
Improved atomic force microscopy imaging using carbon-coated probe tipsDoris, Bruce B.; Hegde, Rama I. · Applied Physics Letters · 1995
Film and Device Characteristics of Sputter-Deposited Hafnium Zirconate Gate DielectricHegde, Rama I. · Journal of The Electrochemical Society · 2008
Interaction of PH3 coadsorbed with H2, D2, O2 and H2O on Rh(100)Rama I. Hegde; J.M. White · 1985
Growth and Film Characteristics of N[sub 2]O and NO Oxynitride Gate and Tunnel DielectricsHegde, Rama I. · Journal of The Electrochemical Society · 1997
Corrosion Inhibition in Neutral, Aerated MediaMansfeld, F. · Journal of The Electrochemical Society · 1985
Electrochemical Aspects of HemosorptionGoldin, Mark M.; Volkov, Alexander G.; Goldfarb, Yury S.; Goldin, Mikhail M. · Journal of The Electrochemical Society · 2006
The Electrochemical Behavior of TitaniumThomas, N. T.; Nobe, Ken · Journal of The Electrochemical Society · 1969
Electrochemical Behavior of TitaniumThomas, N. T.; Nobe, Ken · Journal of The Electrochemical Society · 1972
Etching of Silicon in NaOH SolutionsAllongue, P. · Journal of The Electrochemical Society · 1993
Zirconium Dioxide-Oxygen ReactionsSmith, Tennyson · Journal of The Electrochemical Society · 1964
Pitting Corrosion of MetalsFrankel, G. S. · Journal of The Electrochemical Society · 1998
Large-Scaled Polyacetylene BatteriesNagatomo, Takao · Journal of The Electrochemical Society · 1985