Recent advances in the application of photo-lithographic techniques to semiconductor devices and microminiaturization
- 期刊名称Proceedings of the IEE - Part B: Electronic and Communication Engineering
- 作者Liimatainen, T.M.
- 卷第106卷
- 电子ISSN2054-0418
- 文件大小1277.26KB
- 发表时间1959-05
- DOI10.1049/pi-b-2.1959.0086
- 页码385-390
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