Electron Tunneling in Metal-Semiconductor Barriers
- 期刊名称Physical Review
- 作者Conley, J. W.; Duke, C. B.; Mahan, G. D.; Tiemann, J. J.
- 卷第150卷
- 期第2期
- 印刷ISSN0031-899X
- 文件大小657.31KB
- 发表时间1966-10-14
- DOI10.1103/PhysRev.150.466
- 页码466-469
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