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Nucleation rate and preferred orientation of potentiostatically electro-deposited copper

Nucleation rate and preferred orientation of potentiostatically electro-deposited copper

N. Dhananjayan; G. Eichkorn; H.R. Mache

作者N. Dhananjayan; G. Eichkorn; H.R. Mache
卷第15卷
期第4期
印刷ISSN0013-4686
文件大小401.72KB
发表时间1970
DOI10.1016/0013-4686(70)80013-5
页码617-626

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