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<title>Dual-wavelength photoresist for sub-200-nm lithography</title>

Dual-wavelength photoresist for sub-200-nm lithography

S. Hien; G. Czech; W. Domke; H. Raske; M. Sebald; I. Stiebert; W. Conley

作者S. Hien; G. Czech; W. Domke; H. Raske; M. Sebald; I. Stiebert; W. Conley
文件大小4014.00KB
DOI10.1117/12.312403

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