Surface profile analysis by helium-3 activation; oxygen in silicon
- 期刊名称Analytical Chemistry
- 作者Lamb, James F.; Lee, Diana M.; Markowitz, Samuel S.
- 卷第42卷
- 期第2期
- 印刷ISSN0003-2700
- 电子ISSN1520-6882
- 文件大小454.90KB
- 发表时间1970-02
- DOI10.1021/ac60284a026
- 页码212-215
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