Controlled gold doping of silicon by using ion implantation
- 作者M. Schulz; A. Goetzberger; I. Fränz; W. Langheinrich
- 卷第3卷
- 期第4期
- 印刷ISSN0947-8396
- 电子ISSN1432-0630
- 文件大小475.42KB
- 发表时间1974-04
- DOI10.1007/bf00887275
- 页码275-280
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