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Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatings

Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatings

Thornton, John A.
  • 期刊名称Journal of Vacuum Science and Technology
  • 作者Thornton, John A.
  • 卷第12卷
  • 期第4期
  • 印刷ISSN0022-5355
  • 文件大小1795.86KB
  • 发表时间1975-7
  • DOI10.1116/1.568682
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