Magnetic Domains in Thin Sputtered FeSi Films. I. Edge Effects and Influence of the Substrate Temperature and the Ar Pressure during Sputtering
- 作者I. Pockrand; J. Verweel
- 卷第27卷
- 期第2期
- 印刷ISSN1862-6319
- 文件大小920.36KB
- 发表时间1975
- DOI10.1002/pssa.2210270212
- 页码413-427
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