Pretreatment of metallic substrates with the plasmatron
- 作者S. Schiller; U. Heisig; K. Steinfelder; K. Gehm
- 卷第51卷
- 期第2期
- 印刷ISSN0040-6090
- 文件大小434.47KB
- 发表时间1978
- DOI10.1016/0040-6090(78)90353-x
- 页码189-196
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