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Investigation of SiO2 layers deposited by plasma decomposition of tetra-ethoxy silane in a planar reactor

Investigation of SiO2 layers deposited by plasma decomposition of tetra-ethoxy silane in a planar reactor

K. I. Kirov; S. S. Georgiev; E. V. Gerova; S. P. Aleksandrova

作者K. I. Kirov; S. S. Georgiev; E. V. Gerova; S. P. Aleksandrova
卷第48卷
期第2期
印刷ISSN1862-6319
文件大小383.58KB
发表时间1978
DOI10.1002/pssa.2210480243
页码609-614

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