In-process monitoring and control of doping gas concentration during vapor phase silicon epitaxial growth by using a flame photometric detector

• 作者Takaya Suzuki; Yosuke Inoue; Mitsuru Ura; Takuzo Ogawa; Yoshimitsu Sugita
• 卷第45卷
• 印刷ISSN0022-0248
• 文件大小785.42KB
• 发表时间1978
• DOI10.1016/0022-0248(78)90421-9
• 页码108-117