Defect compensation in doped CVD amorphous silicon
- 作者M. Hirose; M. Taniguchi; T. Nakashita; Y. Osaka; T. Suzuki; S. Hasegawa; T. Shimizu
- 文件大小515.91KB
- 发表时间1980
- DOI10.1016/0022-3093(80)90610-9
- 页码297-302
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