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D.C. reactively sputtered iron oxide films for selectively semitransparent photomasks II: Relation between the structure of the films and their mechanical and chemical properties

D.C. reactively sputtered iron oxide films for selectively semitransparent photomasks II: Relation between the structure of the films and their mechanical and chemical properties

V. Orlinov; B. Goranchev; G. Sarov; A. Misiuk
  • 作者V. Orlinov; B. Goranchev; G. Sarov; A. Misiuk
  • 卷第67卷
  • 期第1期
  • 印刷ISSN0040-6090
  • 文件大小430.13KB
  • 发表时间1980
  • DOI10.1016/0040-6090(80)90297-7
  • 页码135-144
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