Cosputtered molybdenum silicides on thermal SiO2
- 期刊名称Journal of Applied Physics
- 作者Murarka, S. P.; Fraser, D. B.; Retajczyk, T. F.; Sheng, T. T.
- 卷第51卷
- 期第10期
- 印刷ISSN0021-8979
- 文件大小802.31KB
- 发表时间1980
- DOI10.1063/1.327454
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