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An implantation predeposition technique for the introduction of deep-level chemical impurities

An implantation predeposition technique for the introduction of deep-level chemical impurities

Myers, D. R.; Koyama, R. Y.; Phillips, W. E.

期刊名称Radiation Effects
作者Myers, D. R.; Koyama, R. Y.; Phillips, W. E.
卷第48卷
印刷ISSN0033-7579
文件大小386.56KB
发表时间1980-01
DOI10.1080/00337578008209245
页码145-149

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