Pulsed electron beam annealing of sputtered amorphous Si:H films
- 作者J. Tardy; D. Barbier; A. Cachard; A. Laugier; J. Fontenille
- 卷第16卷
- 期第3期
- 印刷ISSN0025-5408
- 文件大小252.75KB
- 发表时间1981
- DOI10.1016/0025-5408(81)90052-0
- 页码347-352
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