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Deposition and Etching of Thin Films by Means of Beam Plasma Discharge with Tube-Like Electron Beam

Deposition and Etching of Thin Films by Means of Beam Plasma Discharge with Tube-Like Electron Beam

V. M. Atamanov; G. B. Levadny; A. A. Ivanov; S. Klagge; M. Maass; Y. F. Nasedkin; U. V. Sereda; A. A. Serov; N. N. Timchenko
  • 作者V. M. Atamanov; G. B. Levadny; A. A. Ivanov; S. Klagge; M. Maass; Y. F. Nasedkin; U. V. Sereda; A. A. Serov; N. N. Timchenko
  • 卷第22卷
  • 期第5期
  • 印刷ISSN0863-1042
  • 电子ISSN1521-3986
  • 文件大小446.65KB
  • 发表时间1982
  • DOI10.1002/ctpp.19820220505
  • 页码427-434
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