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Composition and electron stress effects in silicon nitride thin films made by thermal growth and chemical etching of LPCVD MNOS structures as studied by x-ray photoelectron spectroscopy (XPS)

Composition and electron stress effects in silicon nitride thin films made by thermal growth and chemical etching of LPCVD MNOS structures as studied by x-ray photoelectron spectroscopy (XPS)

J. A. Wurzbach

作者J. A. Wurzbach
文件大小827.55KB
发表时间1982
DOI10.1116/1.571653

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