Preparation of III-V compound semiconductors by metal organic chemical vapor deposition

• 期刊名称Industrial & Engineering Chemistry Product Research and Development
• 作者Biefeld, Robert M.
• 卷第21卷
• 期第4期
• 印刷ISSN0196-4321
• 电子ISSN1541-4841
• 文件大小2250.38KB
• 发表时间1982-12
• DOI10.1021/i300008a001
• 页码525-528