![SPIE Proceedings [SPIE Microelectronic Processing '93 - Monterey, CA (Sunday 26 September 1993)] Microelectronic Processes, Sensors, and Controls - Native oxide removal on Si surface by NF 3 -added hydrogen plasma downstream treatment]()
SPIE Proceedings [SPIE Microelectronic Processing '93 - Monterey, CA (Sunday 26 September 1993)] Microelectronic Processes, Sensors, and Controls - Native oxide removal on Si surface by NF 3 -added hydrogen plasma downstream treatmentKikuchi, Jun; Bondur, James A.; Elliott, Kiefer; Iga, Masao; Fujimura, Shuzo; Hauser, John R.; Kwong, Dim-Lee; Yano, Hiroshi; Ray, Asit K. · 1993