[IRE 1983 International Electron Devices Meeting - ()] 1983 International Electron Devices Meeting - 3-Dimensional SOI/CMOS IC's fabricated by beam recrystallization
Kawamura, S.; Sasaki, N.; Iwai, T.; Mukai, R.; Nakano, M.; Takagi, M.
- 作者Kawamura, S.; Sasaki, N.; Iwai, T.; Mukai, R.; Nakano, M.; Takagi, M.
- 文件大小489.07KB
- 发表时间1983
- DOI10.1109/iedm.1983.190517
- 页码364-367