Characterization of interface states in thin films of thermally grown SiO2
- 作者F Campabadal; X Aymerich-Humet; F Serra-Mestres
- 卷第34卷
- 印刷ISSN0042-207X
- 文件大小292.38KB
- 发表时间1984
- DOI10.1016/0042-207x(84)90187-8
- 页码1005-1007
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