![Enhanced nickelidation rate in silicon nanowires with interfacial lattice disorder]()
Enhanced nickelidation rate in silicon nanowires with interfacial lattice disorderHashimoto, Shuichiro; Yokogawa, Ryo; Oba, Shunsuke; Asada, Shuhei; Xu, Taiyu; Tomita, Motohiro; Ogura, Atsushi; Matsukawa, Takashi; Masahara, Meishoku; Watanabe, Takanobu · Journal of Applied Physics · 2017