NiSi mixing: A new model for low temperature silicide formation
- 作者E.J. Van Loenen; J.F. Van Der Veen; F.K. LeGoues
- 卷第157卷
- 期第1期
- 文件大小1032.89KB
- 发表时间1985
- DOI10.1016/0039-6028(85)90631-4
- 页码1-16
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