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Plasma etching of sputtered Mo and MoSi2 thin films in NF3 gas mixtures: T P Chow and A J Steckl, J Appl Phys, 53 (8), 1982, 5531-5340

Plasma etching of sputtered Mo and MoSi2 thin films in NF3 gas mixtures: T P Chow and A J Steckl, J Appl Phys, 53 (8), 1982, 5531-5340

卷第35卷
期第6期
印刷ISSN0042-207X
文件大小149.67KB
发表时间1985
DOI10.1016/0042-207x(85)90490-7

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