Formation of thick and narrow-spacing metal patterns by lift-off technique using negative photoresists, LMR and LMR-UV

• 作者Yoshio Yamashita; Ryuji Kawazu; Toshio Itoh; Kazutami Kawamura; Seigo Ohno; Kenji Kobayashi; Takateru Asano; Gentaro Nagamatsu
• 卷第3卷
• 印刷ISSN0167-9317
• 文件大小277.61KB
• 发表时间1985
• DOI10.1016/0167-9317(85)90040-1
• 页码305-308