Plasma Etching of CVD Grown Cubic SiC Single Crystals
- 期刊名称Japanese Journal of Applied Physics
- 作者Dohmae, Shinichi; Shibahara, Kentaro; Nishino, Shigehiro; Matsunami, Hiroyuki
- 卷第24卷
- 印刷ISSN0021-4922
- 文件大小441.32KB
- 发表时间1985-11-20
- DOI10.1143/JJAP.24.L873
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