[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Fundamental Limits of Lithography
Thompson, L. F.; Willson, C. G.; Fréchet, J. M. J.
- 作者Thompson, L. F.; Willson, C. G.; Fréchet, J. M. J.
- 文件大小577.50KB
- 发表时间1985
- DOI10.1021/bk-1984-0266.ch001
- 页码5-9