Fast-Turnaround Gate Array Commitment Using E-Beam Generated Masks
- 期刊名称International Journal of Electrical Engineering & Education
- 作者Cottrel, R. A.; Hick, P. J.; Mckell, H. D.
- 卷第22卷
- 期第1期
- 印刷ISSN0020-7209
- 电子ISSN2050-4578
- 文件大小755.66KB
- 发表时间1985-01
- DOI10.1177/002072098502200113
- 页码37-44
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