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Catastrophic breakdown in silicon oxides: The effect of Fe impurities at the SiO2-Si interface

Catastrophic breakdown in silicon oxides: The effect of Fe impurities at the SiO2-Si interface

Honda, Kouichirou; Nakanishi, Toshirou; Ohsawa, Akira; Toyokura, Nobuo

期刊名称Journal of Applied Physics
作者Honda, Kouichirou; Nakanishi, Toshirou; Ohsawa, Akira; Toyokura, Nobuo
卷第62卷
期第5期
印刷ISSN0021-8979
文件大小502.71KB
发表时间1987
DOI10.1063/1.339534

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