发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

Deposition of silicon films from SiCl4 glow discharges: A kinetic model of the surface process

Deposition of silicon films from SiCl4 glow discharges: A kinetic model of the surface process

G. Bruno; P. Capezzuto; G. Cicala; F. Cramarossa

作者G. Bruno; P. Capezzuto; G. Cicala; F. Cramarossa
文件大小704.44KB
发表时间1987
DOI10.1063/1.339548

← 返回【学霸图书馆】主页