Epitaxial Fe films on (100)GaAs substrates by ion beam sputtering
- 期刊名称Applied Physics Letters
- 作者Tustison, Randal W.; Varitimos, Thomas; Van Hook, Jerrold; Schloemann, Ernst F.
- 卷第51卷
- 期第4期
- 印刷ISSN0003-6951
- 文件大小415.05KB
- 发表时间1987
- DOI10.1063/1.98474
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