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Photolytic decomposition of adsorbed tellurium and cadmium alkyl species at 295 K upon 193 nm photon irradiation

Photolytic decomposition of adsorbed tellurium and cadmium alkyl species at 295 K upon 193 nm photon irradiation

Stinespring, C. D.; Freedman, A.
  • 期刊名称Applied Physics Letters
  • 作者Stinespring, C. D.; Freedman, A.
  • 卷第52卷
  • 期第23期
  • 印刷ISSN0003-6951
  • 文件大小579.48KB
  • 发表时间1988
  • DOI10.1063/1.99589
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