Nanometer lithography for III–V semiconductor wires using chloromethylated poly-α-methylstyrene resist
- 期刊名称Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- 作者Maile, B. E.
- 卷第6卷
- 期第6期
- 印刷ISSN0734-211X
- 文件大小837.00KB
- 发表时间1988-11
- DOI10.1116/1.584076
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