Control of epitaxial orientation of Si on CoSi2(111)
- 期刊名称Applied Physics Letters
- 作者Tung, R. T.; Batstone, J. L.
- 卷第52卷
- 期第19期
- 印刷ISSN0003-6951
- 文件大小677.48KB
- 发表时间1988
- DOI10.1063/1.99702
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