Mössbauer study of metallic layers by ion implantation of Co in Si
- 作者A. Vantomme; M.F. Wu; I. Dézsi; G. Langouche
- 卷第38卷
- 印刷ISSN0169-4332
- 文件大小51.46KB
- 发表时间1989
- DOI10.1016/0169-4332(89)90542-4
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