发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

[IEEE International Symposium on VLSI Technology, Systems and Applications - Taipei, Taiwan (17-19 May 1989)] International Symposium on VLSI Technology, Systems and Applications - High temperature alloy and contact annealing with RTA on AlSi/TiW metallization

[IEEE International Symposium on VLSI Technology, Systems and Applications - Taipei, Taiwan (17-19 May 1989)] International Symposium on VLSI Technology, Systems and Applications - High temperature alloy and contact annealing with RTA on AlSi/TiW metallization

Chou, H.M.; Su, W.-D.; Liou, J.C.; Tuan, H.C.

作者Chou, H.M.; Su, W.-D.; Liou, J.C.; Tuan, H.C.
文件大小235.25KB
发表时间1989
DOI10.1109/vtsa.1989.68584
页码68-70

← 返回【学霸图书馆】主页