Photoemission and RHEED Studies of Bonding Properties at the CaF 2 /GaAs(001) Interface
- 期刊名称Japanese Journal of Applied Physics
- 作者Yamada maruo, Yasuko; Oshima, Masaharu; Waho, Takao; Kawamura, Tomoaki
- 卷第28卷
- 印刷ISSN0021-4922
- 文件大小633.46KB
- 发表时间1989-2-20
- DOI10.1143/jjap.28.l299
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