SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Simulation and experimental results in O.6-μm lithography using an I-line stepper
- 作者Bauer, Joachim J.; Mehr, Wolfgang; Glaubitz, Ulrich; Baborski, H.; Haase, Norbert; Mueller, Jens-Ullrich; Pol, Victor
- 卷第1264卷
- 印刷ISSN0277-786X
- 文件大小826.20KB
- 发表时间1990
- DOI10.1117/12.20222
- 页码431-445
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