Deposition of surface layers by the LPCVD process conducted in a TiCl4+ H2atmosphere: contribution of the nitrogen contained in the steel substrate

• 作者J. Michalski; T. Wierzchoń
• 卷第9卷
• 期第4期
• 印刷ISSN0261-8028
• 电子ISSN1573-4811
• 文件大小394.19KB
• 发表时间1990-04
• DOI10.1007/bf00721037
• 页码480-483