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Effective acceptor profiles in chemically and plasma treated WNx/GaAs Shannon contacts from capacitance and current measurements

Effective acceptor profiles in chemically and plasma treated WNx/GaAs Shannon contacts from capacitance and current measurements

Bagnoli, P.E.; Paccagnella, A.; Callegari, A.
  • 作者Bagnoli, P.E.; Paccagnella, A.; Callegari, A.
  • 卷第38卷
  • 期第8期
  • 印刷ISSN0018-9383
  • 电子ISSN1557-9646
  • 文件大小358.25KB
  • 发表时间1991
  • DOI10.1109/16.119041
  • 页码1962-1964
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