Influence of O2 and oxide on Cl/Si surface reactions
- 作者Nahomi Aoto; Eiji Ikawa; Takamaro Kikkawa; Yukinori Kurogi
- 卷第247卷
- 期第1期
- 文件大小906.42KB
- 发表时间1991
- DOI10.1016/0039-6028(91)90191-t
- 页码21-31
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