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Strain and orientation in epitaxial CoSi2(111) layers formed by ion implantation

Strain and orientation in epitaxial CoSi2(111) layers formed by ion implantation

M.F. Wu; A. Vantomme; G. Langouche; H. Vanderstraeten; Y. Bruynseraede

作者M.F. Wu; A. Vantomme; G. Langouche; H. Vanderstraeten; Y. Bruynseraede
卷第54卷
期第4期
文件大小922.49KB
发表时间1991
DOI10.1016/0168-583x(91)95392-q
页码444-452

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