Chlorine/silicon surface reactions under heating
- 作者Nahomi Aoto; Eiji Ikawa; Kikkawa Takamaro; Yukinori Kurogi
- 卷第250卷
- 印刷ISSN0167-2584
- 文件大小74.23KB
- 发表时间1991
- DOI10.1016/0167-2584(91)90580-k
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RbF as reactive and dipole interlayers between the Ge/GaAs interfaceKlauser, Ruth; Oshima, Masaharu; Sugahara, Hirohiko; Murata, Yoshitada; Kato, Hiroo · Physical Review B · 1991
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