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Aqueous phase silylation a new route to plasma developable high resolution resistsR. Sezi; R. Leuschner; M. Sebald; H. Ahne; S. Birkle; H. Borndörfer · 1990
High Performance Resists Tailored for 248 nm Chemical Amplification of Resist Lines TechnologyR. Sezi; H. Borndörfer; R. Leuschner; C. Nölscher; M. Sebald; H. Ahne; S. Birkle · 1991