Crystallization of Amorphous Silicon with Clean Surfaces
- 期刊名称Japanese Journal of Applied Physics
- 作者Sakai, Akira; Ono, Haruhiko; Ishida, Koichi; Niino, Taeko; Tatsumi, Toru
- 卷第30卷
- 印刷ISSN0021-4922
- 文件大小1628.52KB
- 发表时间1991-6-1
- DOI10.1143/jjap.30.l941
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