Evaluation of erbium-doped silicon for optoelectronic applications
- 期刊名称Journal of Applied Physics
- 作者Xie, Y. H.; Fitzgerald, E. A.; Mii, Y. J.
- 卷第70卷
- 期第6期
- 印刷ISSN0021-8979
- 文件大小977.63KB
- 发表时间1991
- DOI10.1063/1.349306
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