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Polymer behavior under plasma etching: Influence of physical properties on kinetics and durability

Polymer behavior under plasma etching: Influence of physical properties on kinetics and durability

Joubert, O.; Paniez, P.; Pons, M.; Pelletier, J.

期刊名称Journal of Applied Physics
作者Joubert, O.; Paniez, P.; Pons, M.; Pelletier, J.
卷第70卷
期第2期
印刷ISSN0021-8979
文件大小993.14KB
发表时间1991
DOI10.1063/1.349609

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